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Technical Sessions
Technical session chairmen and speakers are included in the listing of the Technical Program. The chairmen have assembled a 2010 Workshop program of highly qualified and renowned technologists from the U.S., Europe, and Asia, representing the latest advancements in the field of nano- and micro-lithography. We will also explore the developments in 3-D architecture and their potential advantages.
Technical sessions will run Monday – Thursday. Morning sessions begin at 8 AM, and evening sessions typically end by 10 PM.


- Sunday November 7, 2010: Registration: 5 – 9 PM. Welcome Reception: 6 – 9 PM
- Monday thru Wednesday November 8-10: 8 AM – 10 PM
- Thurs. November 11: 8 AM – 5 PM.

  Sunday
Monday
Tuesday Wednesday Thursday
 
Program
Program
Program
Program
Program
7:00
Breakfast
Breakfast
Breakfast
Breakfast
7:30  
8:00   Welcome Plenary1: Toshikazu Umatate, Nikon VP Plenary 3: J. Warlaumont
VP Sematech
Mike Thompson, Cornell
8:25   Plenary 2: Tatsuhiko Higashiki; Toshiba Joy Cheng IBM
8:50   David Pan, UT Austin Andrezej Strojwas, CMU Franklin Kalk, Photomask
9:15   John Knickerbocker, IBM Naoya Hayashi, DNP Andreas Wild; ENIAC Rudi Hendel, Periodic Structures
9:40   Lars Liebmann, IBM Tim Crimmins; Intel Paul Nealey, UW Andy Neureuther, Berkeley
10:05  
Coffee Break
10:35   Hans Meiling, ASML Mark MacCord, KLA-Ten SV Sreenivasan, UTA Chris Bencher, AMAT
11:00   Serge Tedesco, LETI Simon Wong, Stanford Bruno LaFontaine, Cymer Kevin Lucas, Synopsys
11:25   Lloyd Litt, Sematech Vivek Subramanian, UCB Yu Cao; Brion Andrew Kahng, UCSD
11:50   Chris Progler, Photronics Karl K. Berggren MIT Hank Smith, Lumarray Chenson Chen, MITLL
12:15     Patrick Naulleau, LBNL Andrew Grenville (Inpria)
12:45   Networking
1:15  
1:40   James Blatchford; TI
2:05   Juan de Pablo, U Wisc
2:30   Carlos Fonseca, TEL
2:55   coffee break
3:25   Rick Uchida, TOK
3:50   John Warlaumont, Sematech
4:15     Ed Holland, HP
5:00 Registration starts at 5 Reception (Posters - listed at right) Reception (Posters)
5:30 Reception
6:00 Reception, Activities Signup, Tomilyn Clark, Glass Artist: Info and Sales Table Banquet
6:30
7:00 Wes Hansford, Mosis/ISI - 3D Soichi Owa, Nikon
7:25 Leo Pang, Luminescent Yuri Granik; Mentor
7:50 Luigi Capodieci, GF Walter Hu, UT Dallas
8:15 Cliff Henderson (Georgia Tech) Tom Wallow (Global Foundries) Panel: Optical vs EUV (Lars Liebmann IBM + TBD vs. Bill Arnold ASML + TBD )
8:40   Mike Rieger, Synopsys Kameshwar Poolla; IMPACT
9:05   Vincent Wiaux, IMEC Matt Nowak, Qualcomm